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Breakthrough! The first 28nm domestic lithography machine is coming soon!

As the core equipment of chip manufacturing, lithography machine plays an important role in semiconductor industry. SMEE recently announced that it will deliver the first domestically produced immersion lithography machine with a 28nm process from 2021 to 2022, and the lithography machine will become the most advanced lithography machine in China. Although there is still a big gap with the current mainstream of the Netherlands 7nm chip preparation technology, but after this major breakthrough, the gap has been greatly narrowed, which marks the leap forward of domestic lithography machine. At the same time, SMEE has become the world's second most advanced lithography machine manufacturer after ASML. SYHOGY (XIAMEN) TECH CO.,LTD  engaged in the design and manufacture of intelligent controller, electronic and electrical products, and also undertakes OEM and ODM orders.Welcome to visit our company.

Faced with the ban of the United States, Huawei and SMIC cooperated with each other

A year after Huawei was added to the list of entities in the United States, the United States escalated its crackdown on Huawei on May 15, extending the ban for another 90 days. Most of Huawei's 7nm and 5nm chips are made by TSMC, but due to the constraints of the U.S. program, Huawei started the spare tire program and shifted resources to SMIC. SMIC also reported good news that it will invest 4.3 billion us dollars in equipment, while SMIC also received 6.5 billion us dollars of investment from national integrated circuit and Shanghai integrated circuit. SMIC has increased equipment investment and obtained financial support, which has become a strong support of Huawei. In the face of us sanctions, Huawei has resisted the pressure and risen to the challenge. The strong cooperation with SMIC will also bring the best hope for Chinese chips. SYHOGY (XIAMEN) TECH CO.,LTD engaged in the design and manufacture of intelligent controller, electronic and electrical products, and also under...